Atomic force microscopy A3 Physical vapor deposition processes AuCu alloy Resistive switching CHLORINE PLASMAS Atomic layer etching Chalcogenides Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation B1 Inorganic compounds Buffer Couple Amorphous XPS CaTiO3Pr^3^+ A Chalcogenides Band gap Carbon Band alignment AlN Magnetron sputtering PECVD Chalcogenide Chemical detection SF 6 Spectroscopic ellipsometry Carbon nanotubes Mott insulators Biomasse A Multilayers NEXAFS Transmission electron microscopy X-ray photoelectron spectroscopy Anatase B2 Semiconducting indium compounds B3 Solar cells Adsorption B2 Semiconducting alloys TiO2 Residual stress Carbon nitride Alloying Copper Thin film Biofilms microbiens Titanium dioxide Films Alzheimer's disease Capacitance Mott insulator C Photoelectron spectroscopy Plasmas froids Plasma etching Nanotubes Functionalization TEM Oxides V2O3 Carbon Nanotube Amyloid precursor Structure Selenization Chalcogenide glass Applications industrielles Thin films BOMBARDMENT X-ray diffraction A-CNx Bipolar resistive switching BRS Calcined clay Ambipolar material Etching Aryl-diazonium salts Nanocomposite CH4 Semiconductors A1 Characterization Optical properties Vanadium Sesquioxide Cathepsin Colloidal solution B Chemical synthesis Aluminium nitride Avalanche breakdown Bixbyite Non-volatile memory Sputtering 3 nm in size Physical vapor deposition B2 Quaternary CNTs’ collapse Kirkendall effect AZO thin films Low-pressure plasma processing Transfert d'énergie Sol-gel Biocapteurs Chemical and biological sensors Scanning electron microscopy Ablation laser A Thin films CIGSe